Design for Manufacturability and Yield for Nano-Scale CMOS
Kawa, Jamil, Chiang, Charles
| Autor: | Chiang, Charles Kawa, Jamil |
|---|---|
| Themengebiete: | Betriebssystem (EDV) CAD - Computer Aided Design CAM - Computer Aided Manufacturing CMOS Chip EDV / Theorie / Software-Entw. / Software Engineering Elektrotechnik Ingenieurwissenschaft - Ingenieurwissenschaftler Maschinenbau Nanotechnologie Operating System Technologie / Nanotechnologie |
| Veröffentlichungsdatum: | 26.07.2007 |
| EAN: | 9781402051876 |
| Auflage: | 2007 |
| Sprache: | Englisch |
| Seitenzahl: | 288 |
| Produktart: | Gebunden |
| Verlag: | Springer Springer Netherland Springer Netherlands |
Produktinformationen "Design for Manufacturability and Yield for Nano-Scale CMOS"
Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design¿s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
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